NanoCalc-2000 Thin Film Measurement System
Mikropack
The NanoCalc-2000 Thin Film Measurement System is the ideal tool for fast, reliable and easy measurement of transparent and semi-transparent thin layers.
Depending on the layer and substrate material it can measure layers of just a few nanometers up to several hundreds of microns.
The large spectral range available from 250nm (UV) to 1100nm (NIR), as well as our special simulation algorithms allow the measurement not only of standard samples like oxides, nitrides and resists on ideal substrates like silicon wafer or glass but also the measurement of critical layers like DLC (diamond like carbon) on metal, layers on unpolished steel plates or the thickness of transparent foils.
Short measurement time and the very flexible positioning of the fiber head make this system the first choice for integration into existing machinery as well as for adaptation to almost any microscope and for in situ process control.
Measurement of multi-layers, 3D-thickness profiling with motorized 150mm or 300mm mapping stage, on-line measurement data acquisition and remote control via ActiveX are optionally available.
The large spectral range available from 250nm (UV) to 1100nm (NIR), as well as our special simulation algorithms allow the measurement not only of standard samples like oxides, nitrides and resists on ideal substrates like silicon wafer or glass but also the measurement of critical layers like DLC (diamond like carbon) on metal, layers on unpolished steel plates or the thickness of transparent foils.
Short measurement time and the very flexible positioning of the fiber head make this system the first choice for integration into existing machinery as well as for adaptation to almost any microscope and for in situ process control.
Measurement of multi-layers, 3D-thickness profiling with motorized 150mm or 300mm mapping stage, on-line measurement data acquisition and remote control via ActiveX are optionally available.
